Kavli Affiliate: Clarence Chang
| Summary:
Superconducting thin films with high intrinsic kinetic inductance $L_k$ are important for high-sensitivity detectors, enabling strong coupling in hybrid quantum systems, and enhancing nonlinearities in quantum devices. We report the room-temperature reactive sputtering of titanium nitride thin films with a critical temperature $T_c$ of SI3.8K and a thickness of SI27nm. Fabricated into resonators, these films exhibit a sheet kinetic inductance $L_k, square$ of 394~$textrmpH/square$, as inferred from resonant frequency measurements. %from this film and measure quality factors of $4times 10^4$; these quality factors are likely limited by the low resistivity wafer. X-ray diffraction analysis confirms the formation of stoichiometric TiN, with no residual unreacted titanium. The films also demonstrate a characteristic sheet resistivity of 475~$Ω/square$, yielding an impedance an order of magnitude higher than conventional 50~$Ω$ resonators. This property could enhance microwave singletextendash photon coupling strength by an order of magnitude, offering transformative potential for hybrid quantum systems and quantum sensing. Furthermore, the high $L_k$ enables Kerr nonlinearities comparable to statetextendash oftextendash thetextendash art quantum devices. Combined with its relatively high $T_c$, this thin film presents a promising platform for superconducting devices, including amplifiers and qubits operating at higher temperatures.
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